반응식
O1CCCC1.[C:6]([OH:14])(=[O:13])/[C:7](=[CH:9]\[C:10]([OH:12])=[O:11])/[CH3:8].[C:15]([O:20][CH2:21][CH2:22][OH:23])(=[O:19])[C:16]([CH3:18])=[CH2:17]>C(C(OC(CC)(CC)C)(CC)C)C.CC(N=NC(C#N)(C)C)(C#N)C>[C:6]([OH:14])(=[O:13])/[C:7](=[CH:9]\[C:10]([OH:12])=[O:11])/[CH3:8].[C:15]([O:20][CH2:21][CH2:22][OH:23])(=[O:19])[C:16]([CH3:18])=[CH2:17]참가 물질
6
실험 절차
To 20 g of tetrahydrofuran (THF) were added 5 g of citraconic acid, 5 g of hydroxyethyl methacrylate and 0.1 g of AIBN. The resulting mixture was reacted at 67° C. for 3 hours, after which, the resulting solution was dropped in diethylethyl ether, thereby obtaining 9.6 g of a photoresist polymer of Formula (IIc).
후처리
- customThe resulting mixture was reacted at 67° C. for 3 hours
출처 및 근거
- ORD 기록
- ord-bee63e5f9a174a5e828a7e7b25d3b5a0
- 출처 데이터셋
- uspto-grants-2007_09
- 특허 번호
- US07270934B2
연결된 노트
불러오는 중…