Trifluoroacetic acid → HCID 66977596, compound

HRID 1041914Notes

Reaction equation

HRID 1041914 reaction equation
[CH:1]([C:4]1[N:8]2[CH:9]=[C:10]([O:13][C:14]3[CH:19]=[CH:18][C:17]([CH2:20][C:21](N)=[O:22])=[CH:16][CH:15]=3)[CH:11]=[CH:12][C:7]2=[N:6][N:5]=1)([CH3:3])[CH3:2].C(O)(C(F)(F)F)=[O:25].C1(OC)C=CC=CC=1>C(Cl)Cl>[CH:1]([C:4]1[N:8]2[CH:9]=[C:10]([O:13][C:14]3[CH:15]=[CH:16][C:17]([CH2:20][C:21]([OH:25])=[O:22])=[CH:18][CH:19]=3)[CH:11]=[CH:12][C:7]2=[N:6][N:5]=1)([CH3:2])[CH3:3]

Participants

5

Reactant 3

HCID 6422Trifluoroacetic acidHCID 7519AnisoleHCID 66977505HCID 66977505, compound

Product 1

HCID 66977596HCID 66977596, compound

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

A solution of Example 23 step b (44 mg, 0.12 mmol), TFA (1 mL) and anisole (1 mL) in DCM (1 mL) was stirred at RT for 1 H, then evaporated in vacuo. The resulting residue was suspended in diethyl ether (3 mL), filtered and dried in vacuo to give the title compound (38 mg, quant.). LCMS (Method 5): Rt 3.65 min, m/z 312 [MH+].

Workup

  1. customevaporated in vacuo
  2. filtrationfiltered
  3. customdried in vacuo

Sources & evidence

ORD record
ord-a4c6c735bf994063be8ab92d5723d012
Source dataset
uspto-grants-2013_10
Patent number
US08557797B2

Reaction notes

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