Trifluoroacetic acid → HCID 86707727, compound

HRID 1190832Notes

Reaction equation

HRID 1190832 reaction equation
[CH3:1][C:2]1([CH2:14][C:15]([O:17]C(C)(C)C)=[O:16])[C:6](=[O:7])[N:5]([CH2:8][C:9]([F:12])([F:11])[F:10])[C:4](=[O:13])[NH:3]1.C(O)(C(F)(F)F)=O>C(Cl)Cl>[CH3:1][C:2]1([CH2:14][C:15]([OH:17])=[O:16])[C:6](=[O:7])[N:5]([CH2:8][C:9]([F:11])([F:10])[F:12])[C:4](=[O:13])[NH:3]1

Participants

4

Reactant 2

HCID 6422Trifluoroacetic acidHCID 86707726HCID 86707726, compound

Product 1

HCID 86707727HCID 86707727, compoundYield 109.4%

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

To a solution of Compound 26c (100 mg, 0.32 mmol) in DCM (1 mL) was added TFA (1 mL) and the reaction mixture stirred for 1 h. The mixture was concentrated under reduced pressure, co-evaporated with toluene under reduced pressure, then dried under high vacuum to give Compound 26a (89 mg, 100% yield). LCMS=0.9 min using analytical method (B), 255.1 (M+H). 1H NMR (400 MHz, DMSO-d6) δ 12.50 (br. s., 1H), 8.45 (s, 1H), 4.37-4.00 (m, 2H), 2.88 (d, J=16.8 Hz, 1H), 2.60 (d, J=17.1 Hz, 1H), 1.31 (s, 3H).

Workup

  1. concentrationThe mixture was concentrated under reduced pressure, co-evaporated with toluene under reduced pressure
  2. customdried under high vacuum

Sources & evidence

ORD record
ord-c9fd556121f14d9aae0e4ed69ad3caec
Source dataset
uspto-grants-2014_03
Patent number
US08680090B2

Reaction notes

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