Hexafluoropropylene → HCID 131722199, compound

HRID 1274519Notes

Reaction equation

HRID 1274519 reaction equation
[F:1][C:2]([F:10])([F:9])[C:3]([C:5]([F:8])([F:7])[F:6])=[CH2:4].Cl[F:12].[Al].[F:14][C:15]([F:22])([F:21])[C:16](F)=[C:17]([F:19])[F:18]>[Ni]>[C:3]([CH2:4][C:16](=[C:17]([F:19])[F:18])[C:15]([F:22])([F:21])[F:14])([C:5]([F:8])([F:7])[F:6])([C:2]([F:10])([F:9])[F:1])[F:12]

Participants

5

Reactant 3

HCID 8302HexafluoropropyleneHCID 914503,3,3-Trifluoro-2-(trifluoromethyl)-1-propeneHCID 131722200HCID 131722200, compound

Product 1

HCID 131722199HCID 131722199, compoundYield 34%

Reagents, catalysts & solvents 1

HCID 935NickelCatalyst

Conditions

Temperature
50 °C

Procedure

Hexafluoroisobutene (HFIB) (32 g, 0.2 mol), aluminum chlorofluoride AlClxFy (5 g) and hexafluoropropene (30 g, 0.2 mol) were charged into a 400 mL Hastelloy™ nickel alloy reactor and agitated at 50° C. for 12 hours. The reaction mixture was poured onto ice, the organic (lower) layer was separated, dried over P2O5 and distilled to give 21 g (34% yield) of (CF3)2CFCH2C(CF3)=CF2, b.p. 80.5-81.5 (see Table 1).

Workup

  1. additionThe reaction mixture was poured onto ice
  2. customthe organic (lower) layer was separated
  3. dry with materialdried over P2O5
  4. distillationdistilled

Sources & evidence

ORD record
ord-0fb974b8f8664467be78c13484607481
Source dataset
uspto-grants-2000_12
Patent number
US06156943

Reaction notes

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