Triethylsilane → HCID 11186386, compound
Reaction equation
O[CH:2]([C:14]1[CH:19]=[CH:18][CH:17]=[C:16]([N+:20]([O-:22])=[O:21])[C:15]=1[CH3:23])[C:3]1[N:4]=[CH:5][N:6]([S:8]([N:11]([CH3:13])[CH3:12])(=[O:10])=[O:9])[CH:7]=1.C([SiH](CC)CC)C>FC(F)(F)C(O)=O>[CH3:13][N:11]([CH3:12])[S:8]([N:6]1[CH:7]=[C:3]([CH2:2][C:14]2[CH:19]=[CH:18][CH:17]=[C:16]([N+:20]([O-:22])=[O:21])[C:15]=2[CH3:23])[N:4]=[CH:5]1)(=[O:9])=[O:10]Participants
4
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
A solution of Example 28B in trifluoroacetic acid (15 mL) was treated with triethyl silane (1.5 mL), heated to reflux for 16 hours, cooled, concentrated, tritrated with hexanes, treated with sodium bicarbonate solution and extracted with dichloromethane (×2). The combined dichloromethane layers were dried (MgSO4), filtered and concentrated. Purification of the residue on silica gel with ether provided the desired product enriched in the 3-nitro isomer.
Workup
- temperatureheated
- temperatureto reflux for 16 hours
- temperaturecooled
- concentrationconcentrated
- additiontreated with sodium bicarbonate solution
- extractionextracted with dichloromethane (×2)
- dry with materialThe combined dichloromethane layers were dried (MgSO4)
- filtrationfiltered
- concentrationconcentrated
- customPurification of the residue on silica gel with ether
Sources & evidence
- ORD record
- ord-b950813f40114cd08e166a24c449f33a
- Source dataset
- uspto-grants-2003_01
- Patent number
- US06503935B1
Reaction notes
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