3-(Trimethoxysilyl)propyl methacrylate → 3-(Trimethoxysilyl)propyl methacrylate

HRID 1636198Notes

Reaction equation

HRID 1636198 reaction equation
[C:1]([O:6][CH2:7][CH2:8][CH2:9][Si:10]([O:15][CH3:16])([O:13][CH3:14])[O:11][CH3:12])(=[O:5])[C:2]([CH3:4])=[CH2:3]>C(O)(C)C>[CH3:4][C:2]([C:1]([O:6][CH2:7][CH2:8][CH2:9][Si:10]([O:15][CH3:16])([O:11][CH3:12])[O:13][CH3:14])=[O:5])=[CH2:3].[SiH4:10]

Participants

4

Reactant 1

HCID 173183-(Trimethoxysilyl)propyl methacrylate2×

Product 2

HCID 173183-(Trimethoxysilyl)propyl methacrylateHCID 23953Silane

Reagents, catalysts & solvents 1

HCID 3776IsopropanolSolvent

Procedure

As shown in FIG. 2(a), a soda glass plate which was 25 by 25 cm square and 1.35 mm thick was used as a substrate 3, and the surface of the substrate 3 was treated with γ-methacryloxypropyl trimethoxy silane (KBM503, manufactured by Shinetsu Silicone K.K.). For this purpose, first, KBM503 was dissolved in isopropyl alcohol under stirring for 1 hour to obtain a 0.5 wt % solution. With 6 to 8 ml of the solution being dropped on the glass substrate 3, spin coating was carried out at 300 rpm for the first 5 seconds and then at 500 rpm for the following 15 seconds. Then, baking was carried out for 30 minutes at 120° C. to make the glass substrate 3 and the KBM 503 adhere to each other, thereby forming a silane coupling agent layer 5 on the substrate 3, as shown in FIG. 2(b).

Workup

  1. customto obtain a 0.5 wt % solution
  2. customwas carried out at 300 rpm for the first 5 seconds
  3. customfor the following 15 seconds
  4. waitThen, baking was carried out for 30 minutes at 120° C.

Sources & evidence

ORD record
ord-eddce8279aa840ea8fb3455833598df1
Source dataset
uspto-grants-2000_03
Patent number
US06033810

Reaction notes

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