Trifluoroacetic acid → HCID 44129711, compound
Reaction equation
FC(F)(F)C(O)=O.[Cl:8][C:9]1[CH:10]=[CH:11][C:12]([C:15]([NH:17][C:18]2[CH:19]=[CH:20][C:21]([F:42])=[C:22]([C@:24]34[CH2:33][CH2:32][CH2:31][CH2:30][C@H:29]3[CH2:28][S:27][C:26]([NH:34]C(=O)OC(C)(C)C)=[N:25]4)[CH:23]=2)=[O:16])=[N:13][CH:14]=1.C(=O)(O)[O-].[Na+]>ClCCl.C(OCC)C>[NH2:34][C:26]1[S:27][CH2:28][C@@H:29]2[CH2:30][CH2:31][CH2:32][CH2:33][C@:24]2([C:22]2[CH:23]=[C:18]([NH:17][C:15]([C:12]3[CH:11]=[CH:10][C:9]([Cl:8])=[CH:14][N:13]=3)=[O:16])[CH:19]=[CH:20][C:21]=2[F:42])[N:25]=1Participants
6
Reactant 3
Product 1
Reagents, catalysts & solvents 2
Procedure
Trifluoroacetic acid (200 μL) was added to a solution of the compound of Example 1 (23.0 mg) in dichloromethane (1.00 mL), and the mixture was stirred at room temperature for four hours. The reaction solution was diluted with diethyl ether and neutralized with a sodium bicarbonate solution. The reaction mixture was extracted with ethyl acetate, and the organic layer was washed with a saturated sodium chloride solution. The organic layer was dried over anhydrous magnesium sulfate. The drying agent was removed by filtration and the filtrate was concentrated under reduced pressure to obtain a residue. The residue was purified by NH-silica gel column chromatography to obtain the title compound (18.0 mg).
Workup
- extractionThe reaction mixture was extracted with ethyl acetate
- washthe organic layer was washed with a saturated sodium chloride solution
- dry with materialThe organic layer was dried over anhydrous magnesium sulfate
- customThe drying agent was removed by filtration
- concentrationthe filtrate was concentrated under reduced pressure
- customto obtain a residue
- customThe residue was purified by NH-silica gel column chromatography
Sources & evidence
- ORD record
- ord-03ea8330963846ab840763fd04367052
- Source dataset
- uspto-grants-2012_04
- Patent number
- US08158620B2
Reaction notes
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