Triethylsilane → HCID 69877036, compound
Reaction equation
C([SiH](CC)CC)C.[CH2:8]([C@H:15]1[CH2:19][O:18][C:17](=[O:20])[N:16]1[C:21](=[O:42])[C@@H:22]([O:32][C:33]1[CH:38]=[CH:37][C:36]([CH:39]([CH3:41])[CH3:40])=[CH:35][CH:34]=1)[C@H:23](O)[C:24]1[CH:29]=[CH:28][C:27]([OH:30])=[CH:26][CH:25]=1)[C:9]1[CH:14]=[CH:13][CH:12]=[CH:11][CH:10]=1>FC(F)(F)C(O)=O>[CH2:8]([C@H:15]1[CH2:19][O:18][C:17](=[O:20])[N:16]1[C:21](=[O:42])[C@@H:22]([O:32][C:33]1[CH:38]=[CH:37][C:36]([CH:39]([CH3:40])[CH3:41])=[CH:35][CH:34]=1)[CH2:23][C:24]1[CH:29]=[CH:28][C:27]([OH:30])=[CH:26][CH:25]=1)[C:9]1[CH:14]=[CH:13][CH:12]=[CH:11][CH:10]=1Participants
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
Triethylsilane (30.2 ml) was added to a solution of (S)-4-benzyl-3-[(2S,3R)-3-hydroxy-3-(4-hydroxyphenyl)-2-(4-isopropylphenoxy)propionyl]oxazolidine-2-one (18.0 g), which is the product of Reference example 29(c), in trifluoroacetic acid (150 ml) at ambient temperature. The mixture was stirred for 18 hours. The reaction mixture was concentrated under reduced pressure. The residue was partitioned between ethyl acetate and water and the layers were separated. The ethyl acetate layer was washed with saturated aqueous sodium hydrogencarbonate solution, aqueous hydrogen chloride solution (1N) and saturated aqueous sodium chloride solution and dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue was purified via chromatography on a silica gel column using hexane/ethyl acetate=3/1 as the eluant to afford the desired compound (10.7 g) as colorless crystals.
Workup
- customat ambient temperature
- concentrationThe reaction mixture was concentrated under reduced pressure
- customThe residue was partitioned between ethyl acetate and water
- customthe layers were separated
- washThe ethyl acetate layer was washed with saturated aqueous sodium hydrogencarbonate solution, aqueous hydrogen chloride solution (1N) and saturated aqueous sodium chloride solution
- dry with materialdried over anhydrous magnesium sulfate
- concentrationconcentrated under reduced pressure
- customThe residue was purified via chromatography on a silica gel column
Sources & evidence
- ORD record
- ord-df9a29b981c54a76ba00107ded530bb9
- Source dataset
- uspto-grants-2003_03
- Patent number
- US06528525B1
Reaction notes
Loading…