Durene → 1,1-Diphenylbutane

HRID 1882181Notes

Reaction equation

C(O[SiH](O[CH2:9][CH3:10])OCC)C.[C:11]1([C:13](=[CH:15][C:16](=[C:18]([CH:20]=1)C)C)C)[CH3:12]>>[C:11]1([CH:12]([C:10]2[CH:9]=[CH:18][CH:20]=[CH:11][CH:12]=2)[CH2:13][CH2:15][CH3:16])[CH:20]=[CH:18][CH:16]=[CH:15][CH:13]=1

Participants

Reactant 2

HCID 7269Durene

HCID 13830Triethoxysilane4×

Product 1

HCID 697531,1-Diphenylbutane

Procedure

Triethoxisilane (compound 2, 0.6 mmol) instead of pentamethyldisiloxane was used for the same reaction to Example 14A. 1H-NMR analysis with durene as an internal standard material without isolation of products showed that (4,4-diphenylbuthyl) triethoxysilane (compound 3) was produced with the yield of 85%, and 1,1-diphenylbutane (compound 4) was produced with the yield of 6%.

Workup

customwas produced with the yield of 85%

Sources & evidence

ORD record: ord-917aa428d7844a5aaa678c34858fb67e
Source dataset: uspto-grants-2012_11
DOI: 10.6084/m9.figshare.5104873.v1
Patent number: US08318967B2

Reaction notes

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