Cesium carbonate → HCID 67492228, compound

HRID 1923217Notes

Reaction equation

HRID 1923217 reaction equation
Cl[C:2]1[N:10]=[C:9]2[C:5]([N:6]=[C:7]([CH2:12][N:13]3[CH2:18][C@@H:17]4[CH2:19][C@H:14]3[CH2:15][N:16]4[C:20]([CH3:24])([CH3:23])[CH2:21][OH:22])[N:8]2[CH3:11])=[C:4]([N:25]2[CH2:30][CH2:29][O:28][CH2:27][CH2:26]2)[N:3]=1.[CH2:31]([C:33]1[NH:37][C:36]2[CH:38]=[CH:39][CH:40]=[CH:41][C:35]=2[N:34]=1)[CH3:32].CC(C1C=C(C(C)C)C(C2C=CC=CC=2P(C2CCCCC2)C2CCCCC2)=C(C(C)C)C=1)C.C(=O)([O-])[O-].[Cs+].[Cs+]>CN(C=O)C.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.[Pd].[Pd]>[CH2:31]([C:33]1[N:34]([C:2]2[N:10]=[C:9]3[C:5]([N:6]=[C:7]([CH2:12][N:13]4[CH2:18][C@@H:17]5[CH2:19][C@H:14]4[CH2:15][N:16]5[C:20]([CH3:23])([CH3:24])[CH2:21][OH:22])[N:8]3[CH3:11])=[C:4]([N:25]3[CH2:30][CH2:29][O:28][CH2:27][CH2:26]3)[N:3]=2)[C:35]2[CH:41]=[CH:40][CH:39]=[CH:38][C:36]=2[N:37]=1)[CH3:32]

Participants

7

Procedure

A mixture of 2-[(1S,4S)-5-(2-chloro-9-methyl-6-morpholin-4-yl-9H-purin-8-ylmethyl)-2,5-diazabicyclo[2.2.1]hept-2-yl]-2-methylpropan-1-ol (50 mg, 0.12 mmol), 2-ethyl-1H-benzoimidazole (20 mg, 0.14 mmol), Pd2dba3 (3 mg, 0.003 mmol), Xphos (6 mg, 0.012 mmol) and cesium carbonate (56 mg, 0.17 mmol) in DMF (1 mL) was purged with argon gas then subjected to microwave irradiation at 150° C. for 1 h. The reaction mixture was loaded onto an Isolute® SCX-2 cartridge (10 g), which was washed with MeOH/DCM before the desired product was eluted with 2 M NH3 in MeOH/DCM. The product was collected and concentrated in vacuo. The resultant residue was purified by flash chromatography (Si—PPC, DCM:MeOH 100:0 to 95:5 to 90:10 to 80:20) to afford 521 as a tan solid (27 mg, 44%). LCMS (Method I): RT=2.50 min, M+H+=546. 1H NMR (CDCl3, 400 MHz) δ 8.01 (m, 1 H); 7.75 (m, 1 H); 7.28 (m, 2 H); 4.34 (m, 4 H); 4.02 (m, 2 H); 3.93-3.79 (m, 7 H); 3.49 (m, 2 H); 3.45-3.27 (m, 3 H); 2.89 (m, 2 H); 1.85 (s, 2 H); 1.64 (m, 3 H); 1.48-1.42 (m, 3 H) and 1.33-1.08 (m, 6 H)

Workup

  1. customwas purged with argon gas
  2. customirradiation at 150° C. for 1 h
  3. washwas washed with MeOH/DCM before the desired product
  4. washwas eluted with 2 M NH3 in MeOH/DCM
  5. customThe product was collected
  6. concentrationconcentrated in vacuo
  7. customThe resultant residue was purified by flash chromatography (Si—PPC, DCM:MeOH 100:0 to 95:5 to 90:10 to 80:20)

Sources & evidence

ORD record
ord-cdc01ef7640346b7b6700b25916c899d
Source dataset
uspto-grants-2012_05
Patent number
US08173650B2

Reaction notes

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