反应详情
EQUATION
反应方程式
REACTANTS
反应物
Thioglycolic acid
C2H4O2S
2,6-Dimethylpyridine
C7H9N
Triethylamine
C6H15N
Triphenylphosphine
C18H15P
Stannous chloride dihydrate
Cl2H4O2Sn
Benzoic acid, 4-methoxy-3-nitro-
C8H7NO5
Benzenesulfonyl chloride, 2,4-dinitro-
C6H3ClN2O6S
3-Methylbenzeneethanol
C9H12O
Diisopropyl azodicarboxylate
C8H14N2O4
PRODUCTS
生成物
AUXILIARIES
试剂、催化剂与溶剂
CONDITIONS
反应条件
- 温度
- 0 °C
PROCEDURE
实验过程
The title compound was prepared according to the general procedure described in example 125 using 0.5 g of resin (0.75 mmol/g). 4-Methoxy-3-nitro-benzoic acid in place of the hydroxy-substituted benzoic acid was used in the acylation step, and the nitro group was subsequently reduced with a 1 M solution of tin(II) chloride dihydrate in DMF overnight. The resin was washed with DMF, DCM and reacted with 2,4-dinitro-benzenesulfonyl chloride (5 equivalents) and 2,6-lutidine (10 equivalents) dissolved in 5 ml of DCM for 5 h. After washing with DCM and THF, a solution of triphenylphosphine (10 equivalents) and 2-(3-methylphenyl)-ethanol (10 equivalents) in THF was added to the resin and the slurry was cooled to 0° C. DIAD was added to the cooled mixture and the reaction mixture was shaken overnight at room temperature. The resin was washed with DCM and treated with mercaptoacetic acid (5 equivalents) and triethylamine (10 equivalents) in DCM for 10 min. The step was repeated with a fresh solution. The resin was washed with DMF and DCM. The compound was cleaved from the resin with neat TFA for 2 h, the carboxylic acid amide was converted into the carboxylic acid as described in the general procedure in example 125 and the title compound purified by preparative RP HPLC (water/ACN gradient). Yield: 36.4 mg.
WORKUP
后处理
- washThe resin was washed with DMF, DCM
- washAfter washing with DCM and THF
- washThe resin was washed with DCM
- washThe resin was washed with DMF and DCM
- waitThe compound was cleaved from the resin with neat TFA for 2 h
- customthe title compound purified by preparative RP HPLC (water/ACN gradient)