Benzylamine → HCID 86616586, compound

HRID 2108314Notes

Reaction equation

HRID 2108314 reaction equation
[CH2:1]([NH2:8])[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.C[Al](C)C.[F:13][C:14]([F:31])([C:20]([F:30])([F:29])[C:21]([F:28])([F:27])[C:22](OCC)=[O:23])[C:15](OCC)=[O:16].[H-].[Na+]>C(Cl)Cl.O.CCCCCC>[CH2:1]([N:8]1[C:22](=[O:23])[C:21]([F:27])([F:28])[C:20]([F:29])([F:30])[C:14]([F:31])([F:13])[C:15]1=[O:16])[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1

Participants

8

Procedure

Dissolve 3.4 mmol of benzylamine in 12 mL of methylene chloride and cool in an ice/water bath under argon. Add 4.1 mmol of trimethylaluminum as a 2 M hexane solution dropwise during several minutes. Stir for 10 min, then add 3.4 mmol of the product of Example 7 as a solution in 4 mL of methylene chloride. Remove ice bath and stir for 2 h at room temperature, then heat under reflux for 3 h. Cool in an ice/water bath and cautiously decompose excess trimethylaluminum with water. Partition the reaction mixture between 30 mL each of ether and water and wash the organic layer with 1N HCl, saturated sodium bicarbonate, and brine, then dry over MgSO4 and concentrate in vacuo. Dissolve the residue in 2 mL of DMF and add to a slurry of 3.5 mmol of sodium hydride (washed with hexane twice to remove mineral oil) and 4 mL of DMF under argon. Stir for 16 h at room temperature. Cautiously decompose excess sodium hydride with several drops of water and partition the mixture between ethyl acetate and water. Extract the aqueous layer twice with more ethyl acetate, then wash the combined organic layers with 1N HCl, saturated sodium bicarbonate, and brine. Dry over MgSO4 and concentrate in vacuo. Purify the residue by silica gel chromatography using ethyl acetate/hexanes eluant to yield the title compound.

Workup

  1. temperaturecool in an ice/water bath under argon
  2. stirringRemove ice bath and stir for 2 h at room temperature
  3. temperatureheat
  4. temperatureunder reflux for 3 h
  5. temperatureCool in an ice/water bath
  6. customPartition the reaction mixture between 30 mL each of ether and water
  7. washwash the organic layer with 1N HCl, saturated sodium bicarbonate, and brine
  8. dry with materialdry over MgSO4
  9. concentrationconcentrate in vacuo
  10. dissolutionDissolve the residue in 2 mL of DMF
  11. washwashed with hexane twice
  12. customto remove mineral oil) and 4 mL of DMF under argon
  13. stirringStir for 16 h at room temperature
  14. customCautiously decompose excess sodium hydride with several drops of water and partition the mixture between ethyl acetate and water
  15. extractionExtract the aqueous layer twice with more ethyl acetate
  16. washwash the combined organic layers with 1N HCl, saturated sodium bicarbonate, and brine
  17. dry with materialDry over MgSO4
  18. concentrationconcentrate in vacuo
  19. customPurify the residue by silica gel chromatography

Sources & evidence

ORD record
ord-75be9fd997ff46318c22bedcbac45d50
Source dataset
uspto-grants-2009_04
Patent number
US07514068B2

Reaction notes

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