HRID2416985

反应详情

EQUATION

反应方程式

HRID 2416985 的结构方程式

AUXILIARIES

试剂、催化剂与溶剂

3

CONDITIONS

反应条件

温度
100 °C

PROCEDURE

实验过程

To a suspension of 6-[3-(1-adamantyl)-4-methoxyphenyl]-2-naphthalene-carboxylic acid (3 g, 7.27 mmoles) in dry toluene (20 mL) was added thionyl chloride (0.6 mL, 8.22 mmoles) and DMF (0.04 mL) under argon. The reaction mixture was heated to 100° C. for ten minutes and another 0.04 mL of DMF was added. After 30 minutes, more thionyl chloride (0.1 mL, 1.37 mmoles) was added and the reaction mixture was heated to 110° C. for 60 minutes. The solvent and excess thionyl chloride were removed in vacuo. The resulting solid was stirred with 100 mL dry methylene chloride under argon. This was added to a mixture of ethylene diamine (5.25 mL, 70 mmoles) in dry methylene chloride under argon at 0° C. while stirring rapidly. The solution was allowed to warm to ambient temperature while stirring rapidly during one hour. The reaction mixture was poured carefully into 350 mL of 1N aqueous HCl while stirring, and the methylene chloride was removed in vacuo. The resulting precipitate (hydrochloride salt of the product) was washed with 1N HCl, water, THF, and methylene chloride. Yield of hydrochloride salt 2.76 g, 77%. The free base was generated by neutralizing with aqueous sodium bicarbonate and extracting the product into tetrahydrofuran, drying the organic layer over sodium sulfate, and removing the solvent MS 455 (M+H+).

WORKUP

后处理

  1. temperaturethe reaction mixture was heated to 110° C. for 60 minutes
  2. customThe solvent and excess thionyl chloride were removed in vacuo
  3. stirringwhile stirring rapidly
  4. temperatureto warm to ambient temperature
  5. stirringwhile stirring rapidly during one hour
  6. stirringwhile stirring
  7. customthe methylene chloride was removed in vacuo
  8. washThe resulting precipitate (hydrochloride salt of the product) was washed with 1N HCl, water, THF, and methylene chloride
  9. extractionextracting the product into tetrahydrofuran
  10. dry with materialdrying the organic layer over sodium sulfate
  11. customremoving the solvent MS 455 (M+H+)