Triethylamine → HCID 69218675, compound
Reaction equation
[NH2:1][C:2]1[CH:7]=[C:6]([O:8][CH3:9])[C:5]([Br:10])=[CH:4][C:3]=1[NH:11][C:12]1[CH:20]=[C:19]([Cl:21])[CH:18]=[CH:17][C:13]=1[C:14](O)=[O:15].CN(C(ON1N=NC2C=CC=NC1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.CCN(CC)CC>CN(C=O)C>[Br:10][C:5]1[C:6]([O:8][CH3:9])=[CH:7][C:2]2[NH:1][C:14](=[O:15])[C:13]3[CH:17]=[CH:18][C:19]([Cl:21])=[CH:20][C:12]=3[NH:11][C:3]=2[CH:4]=1Participants
5
Reactant 3
Product 1
Reagents, catalysts & solvents 1
Procedure
A mixture of Example 223F (0.35 g, 0.94 mmol), HATU (0.430 g, 1.13 mmol), and excess Et3N in 4 mL of DMF was stirred overnight. The reaction mixture was partitioned between EtOAc and H2O. The organic layer was washed with brine, dried (MgSO4), filtrated and concentrated to give 0.34 g of the title compound. MS (DCI) m/e 248 (M+H)+; 1H NMR (500 MHz, DMSO-d6) δ 9.89 (s, 1H), 7.90 (s, 1H), 7.67 (d, J=8.42 Hz, 1H), 7.19 (s, 1H), 7.00 (d, J=1.87 Hz, 1H), 6.93 (dd, J=8.42, 2.18 Hz, 1H), 6.75 (s, 1H), 5.22 (s, 2H), 3.73 (s, 3H).
Workup
- customThe reaction mixture was partitioned between EtOAc and H2O
- washThe organic layer was washed with brine
- dry with materialdried (MgSO4)
- filtrationfiltrated
- concentrationconcentrated
Sources & evidence
- ORD record
- ord-f31185db6de946e9b251b6320a6fff98
- Source dataset
- uspto-grants-2008_11
- Patent number
- US07456169B2
Reaction notes
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