Trifluoroacetic acid → HCID 22868979, compound
Reaction equation
FC(F)(F)C(O)=O.C1(OC)C=CC=CC=1.[CH3:16][N:17]([CH2:39][C:40]1[CH:45]=[CH:44][CH:43]=[CH:42][CH:41]=1)[C:18](=[O:38])[C@@H:19]([NH:30]C(OC(C)(C)C)=O)[CH2:20][C:21]1[C:29]2[C:24](=[CH:25][CH:26]=[CH:27][CH:28]=2)[NH:23][CH:22]=1>>[CH3:16][N:17]([CH2:39][C:40]1[CH:45]=[CH:44][CH:43]=[CH:42][CH:41]=1)[C:18](=[O:38])[C@@H:19]([NH2:30])[CH2:20][C:21]1[C:29]2[C:24](=[CH:25][CH:26]=[CH:27][CH:28]=2)[NH:23][CH:22]=1Participants
4
Conditions
- Temperature
- 0 °C
Procedure
Cold trifluoroacetic acid (TFA, 4 mL) and 0.36 mL of anisole (3.28 mmol) were added to 1.215 g (2.98 mmol) of N-methyl-N-benzyl-2-(S)-t-butyloxycarbonylamino-3-(3-indolyl)propionamide and the resulting solution was stirred at 0° C. for 15 min. The ice bath was removed and the solution was allowed to warm to room temperature. After 30 min the reaction mixture was concentrated and the residue was partitioned between saturated NaHCO3 and CH2Cl2. The organic layer was washed with brine, dried and concentrated leaving 1.044 g of the title compound which was used in the next step without purification.
Workup
- customThe ice bath was removed
- temperatureto warm to room temperature
- concentrationAfter 30 min the reaction mixture was concentrated
- customthe residue was partitioned between saturated NaHCO3 and CH2Cl2
- washThe organic layer was washed with brine
- customdried
- concentrationconcentrated
Sources & evidence
- ORD record
- ord-c7c0e6045f034cd38c2a3de589d7939a
- Source dataset
- uspto-grants-1999_02
- Patent number
- US05869489
Reaction notes
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