Trifluoroacetic acid → HCID 52913937, compound
Reaction equation
C[O:2][CH:3](OC)[C:4]1[CH:27]=[CH:26][C:7]([O:8][C:9]2[N:13]([CH2:14][CH3:15])[N:12]=[C:11]([C:16]3[CH:17]=[C:18]([C:22]([NH2:25])([CH3:24])[CH3:23])[CH:19]=[CH:20][CH:21]=3)[CH:10]=2)=[CH:6][CH:5]=1.[F:30][C:31]([F:38])([F:37])[CH2:32][S:33](Cl)(=[O:35])=[O:34].C(N(CC)CC)C.C(O)(C(F)(F)F)=O>C(Cl)Cl.O>[CH2:14]([N:13]1[C:9]([O:8][C:7]2[CH:26]=[CH:27][C:4]([CH:3]=[O:2])=[CH:5][CH:6]=2)=[CH:10][C:11]([C:16]2[CH:17]=[C:18]([C:22]([NH:25][S:33]([CH2:32][C:31]([F:38])([F:37])[F:30])(=[O:35])=[O:34])([CH3:24])[CH3:23])[CH:19]=[CH:20][CH:21]=2)=[N:12]1)[CH3:15]Participants
Conditions
- Temperature
- -78 °C
Procedure
2-(3-{5-[4-(dimethoxymethyl)phenoxy]-1-ethyl-1H-pyrazol-3-yl}phenyl)propan-2-amine (8.84 g, 22.35 mmol, 1 equiv) was stirred at −78° C. in anhydrous DCM (224 mL). 2,2,2-trifluoroethanesulfonyl chloride (4.90 g, 26.80 mmol, 1.2 equiv) was added, followed by triethylamine (4.67 mL, 33.50 mmol, 1.5 equiv). After stirring at −78° C. for 10 minutes the cooling bath was removed and the mixture was allowed to slowly warm to 22° C. Upon reaching 22° C. 7:1 Water:TFA (4.5 equiv) was added to the vigorously stirring reaction mixture. After stirring for 1 hour the mixture was partitioned between water and DCM. The organic layer was washed with brine, dried over anhydrous magnesium sulfate and concentrated in vacuo to give the N-(2-{3-[1-ethyl-5-(4-formylphenoxy)-1H-pyrazol-3-yl]phenyl}propan-2-yl)-2,2,2-trifluoroethanesulfonamide (98% Yield). Calcd (M+1)+: 496.1. Found: 496.1.
Workup
- customwas removed
- temperatureto slowly warm to 22° C
- customUpon reaching 22° C
- stirringvigorously stirring
- customreaction mixture
- stirringAfter stirring for 1 hour the mixture
- customwas partitioned between water and DCM
- washThe organic layer was washed with brine
- dry with materialdried over anhydrous magnesium sulfate
- concentrationconcentrated in vacuo
Sources & evidence
- ORD record
- ord-23f00ed4ec214e1482648ecebf78dd72
- Source dataset
- uspto-grants-2014_10
- Patent number
- US08871796B2
Reaction notes
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