Acetic Acid → HCID 58940638, compound
Reaction equation
[CH3:1][C:2]([CH3:19])([CH3:18])[CH2:3][CH2:4][NH:5][C:6]1[CH:11]=[C:10]([NH:12][C@@H:13]2[CH2:17][CH2:16][NH:15][CH2:14]2)[N:9]=[CH:8][N:7]=1.C=O.[C:22](O)(=O)C.C(O[BH-](OC(=O)C)OC(=O)C)(=O)C.[Na+]>C1COCC1>[CH3:1][C:2]([CH3:19])([CH3:18])[CH2:3][CH2:4][NH:5][C:6]1[CH:11]=[C:10]([NH:12][C@@H:13]2[CH2:17][CH2:16][N:15]([CH3:22])[CH2:14]2)[N:9]=[CH:8][N:7]=1Participants
Reactant 4
Product 1
Reagents, catalysts & solvents 1
Procedure
A suspension of the compound of example 7 (38 mg, 0.144 mmol) in THF (1.5 mL) containing aqueous formaldehyde (11 μL, 0.144 mmol, 37% in water) and acetic acid (8.3 μL, 0.144 mmol) was treated with sodium triacetoxyborohydride (37 mg, 0.173 mmol) and stirred at ambient temperature for 10 min. The reaction mixture was applied directly to SCX resin, eluting non-basic compounds with MeOH and the basic compounds with 1 N ammonia in MeOH. The basic washings were concentrated in vacuo and purified by flash column chromatography on silica gel eluting with DCM:MeOH:0.880 ammonia (1:0:0 changing to 40:10:1, by volume) further purification on reverse phase silica eluting with water:acetonitrile (1:0 changing to 19:1 by volume) gave the title compound as a white solid (14 mg, 35%).
Workup
- washeluting non-basic compounds with MeOH
- concentrationThe basic washings were concentrated in vacuo
- custompurified by flash column chromatography on silica gel eluting with DCM
- customMeOH:0.880 ammonia (1:0:0 changing to 40:10:1, by volume) further purification on reverse phase silica eluting with water:acetonitrile (1:0 changing to 19:1 by volume)
Sources & evidence
- ORD record
- ord-ece266e447824b7ea891d35fa4653c6b
- Source dataset
- uspto-grants-2011_05
- Patent number
- US07943628B2
Reaction notes
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