Carbon Tetrachloride → HCID 22112747, compound

HRID 564752Notes

Reaction equation

HRID 564752 reaction equation
C([CH2:3][CH2:4][CH2:5][CH2:6][CH2:7][C:8]([OH:10])=[O:9])=O.[CH2:11]([N:13](CC)CC)C.ClC(Cl)(Cl)Cl.C1(P(C2C=CC=CC=2)C2C=CC=CC=2)C=CC=CC=1>ClCCl>[N+:13]([CH2:3][CH2:4][CH2:5][CH2:6][CH2:7][C:8]([OH:10])=[O:9])#[C-:11]

Participants

6

Reactant 4

HCID 5943Carbon TetrachlorideHCID 8471TriethylamineHCID 11776TriphenylphosphineHCID 1697327-Oxoheptanoic acid

Product 1

HCID 22112747HCID 22112747, compound

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

To a stirred mixture of the above 6-formyl hexanoic acid Wang-resin ester (165 g, 0.16 mol) in dichloromethane (3.2 l) was added triethylamine (222 ml, 1.6 mol), tetrachloromethane (155 ml, 1.6 mol) and triphenylphosphine (168 g, 0.64 mol). The resulting mixture was stirred at room temperature for 16 h under an atmosphere of nitrogen. The resin was filtered off and washed with N,N-dimethylformamide, dichloromethane, methanol, dichloromethane and dried in a vacuum desiccator for 18 h which afforded 6-isocyano-hexanoic acid Wang-resin ester.

Workup

  1. filtrationThe resin was filtered off
  2. washwashed with N,N-dimethylformamide, dichloromethane, methanol, dichloromethane
  3. customdried in a vacuum desiccator for 18 h which

Sources & evidence

ORD record
ord-1f358240bfd74542823b78c690ffd8e8
Source dataset
uspto-grants-2001_01
Patent number
US06169087A

Reaction notes

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