Hydrochloric Acid → HCID 15158210, compound

HRID 704689Notes

Reaction equation

HRID 704689 reaction equation
[CH:1]1([CH2:6][C:7]([C:9]2[CH:14]=[CH:13][C:12]([CH:15]3OCC[O:16]3)=[CH:11][CH:10]=2)=[O:8])[CH2:5][CH2:4][CH2:3][CH2:2]1.Cl>C1COCC1>[CH:1]1([CH2:6][C:7]([C:9]2[CH:14]=[CH:13][C:12]([CH:15]=[O:16])=[CH:11][CH:10]=2)=[O:8])[CH2:5][CH2:4][CH2:3][CH2:2]1

Participants

4

Reactant 2

HCID 313Hydrochloric AcidHCID 15158209HCID 15158209, compound

Product 1

HCID 15158210HCID 15158210, compoundYield 95%

Reagents, catalysts & solvents 1

HCID 8028TetrahydrofuranSolvent

Procedure

The product of Example D (2.8 g, 0.011 mole) was dissolved in 50 mls of THF and 5 mls of 1N HCl was added. The mixture was refluxed for 3 hours and cooled. The solvent was removed on the rotary evaporator. The residue was dissolved in ethyl acetate and washed with 7% NaHCO3. After drying the solution over Na2SO4, the organic layer was concentrated on the rotary evaporator and the residue was chromatographed on silica gel using 5% ethyl acetate/hexane to give 2.2 g of the title compound (95% yield) as an oil.

Workup

  1. temperatureThe mixture was refluxed for 3 hours
  2. temperaturecooled
  3. customThe solvent was removed on the rotary evaporator
  4. dissolutionThe residue was dissolved in ethyl acetate
  5. washwashed with 7% NaHCO3
  6. dry with materialAfter drying the solution over Na2SO4
  7. concentrationthe organic layer was concentrated on the rotary evaporator
  8. customthe residue was chromatographed on silica gel using 5% ethyl acetate/hexane

Sources & evidence

ORD record
ord-4eac53c7f4ce4e94a9b225d5c62fed88
Source dataset
uspto-grants-1991_01
Patent number
US04988707

Reaction notes

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