Hydrochloric Acid → HCID 86642985, compound
Reaction equation
[C:1]1([CH3:18])[CH:6]=[CH:5][C:4](S(OCCCCCC#C)(=O)=O)=[CH:3][CH:2]=1.[F:19][C:20]([F:30])([F:29])[CH2:21][CH2:22][S:23]([CH2:26][C:27]#[N:28])(=[O:25])=[O:24].C(=O)([O-])[O-].[K+].[K+].Cl>CS(C)=O>[F:30][C:20]([F:19])([F:29])[CH2:21][CH2:22][S:23]([CH:26]([CH2:6][CH2:5][CH2:4][CH2:3][CH2:2][C:1]#[CH:18])[C:27]#[N:28])(=[O:24])=[O:25]Participants
Conditions
- Temperature
- 60 °C
Procedure
To a solution of 1.0 g of 6-heptynyl p-toluenesulfonate and 0.8 g of (3,3,3-trifluoropropylsulfonyl)acetonitrile in 20 ml of dimethyl sulfoxide was added 0.5 g of potassium carbonate at room temperature. The reaction mixture was stirred at room temperature for 1 hour and at 60° C. for 2 days. The reaction mixture was allowed to stand to cool to nearly room temperature. To the reaction mixture was added 10% hydrochloric acid and then extracted with ethyl acetate. The organic layer was washed with a saturated sodium chloride aqueous solution, dried over anhydrous magnesium sulfate, and then concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 0.23 g of 2-(3,3,3-trifluoropropylsulfonyl)-8-nonynenitrile (hereinafter referred to as the present compound (24)).
Workup
- temperatureto cool to nearly room temperature
- extractionextracted with ethyl acetate
- washThe organic layer was washed with a saturated sodium chloride aqueous solution
- dry with materialdried over anhydrous magnesium sulfate
- concentrationconcentrated under reduced pressure
Sources & evidence
- ORD record
- ord-7a6f6b8ac15647f0917195b3eb2ae322
- Source dataset
- uspto-grants-2012_08
- Patent number
- US08247595B2
Reaction notes
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