Water → Hexamethyldisiloxane

HRID 323775

Reaktionsgleichung

Reaktionsgleichung von HRID 323775
C([Si:5]([CH3:8])([CH3:7])[CH3:6])(F)(F)F.CCCC[N+](CCCC)(CCCC)CCCC.[F-].[OH2:27]>C1COCC1.C([O-])(O)=O.[Na+]>[Si:5]([O:27][Si:5]([CH3:8])([CH3:7])[CH3:6])([CH3:8])([CH3:7])[CH3:6]

Komponenten

6

Reaktionsbedingungen

Temperatur
0 °C

Versuchsvorschrift

This material was dissolved in THF (0.1 mL), cooled to at 0° C. and treated with 0.5 M CF3TMS in THF (30 μL, 15 mmol) followed by 0.05 M TBAF in THF (5 mL, 0.025 mmol). After stirring for 30 min, the reaction mixture was diluted with saturated aqueous NaHCO3 (2 mL) and H2O (1 mL), extracted with EtOAc (6×), dried over Na2SO4, filtered and concentrated to give the crude bis-TMS ether.

Aufarbeitung

  1. extractionextracted with EtOAc (6×)
  2. dry with materialdried over Na2SO4
  3. filtrationfiltered
  4. concentrationconcentrated

Quellen und Nachweise

ORD-Eintrag
ord-bb8af9c936b34f9785f43c390c91e310
Quelldatensatz
uspto-grants-2001_04
Patentnummer
US06214865B1

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