反応式
NCC([NH:5][C@H:6]([C:13]([OH:15])=[O:14])[CH2:7][C:8]1[N:12]=[CH:11][NH:10][CH:9]=1)=O.C(SC(=N)N)C.OS(O)(=O)=O.[NH2:27]CC(N[C@H](C(O)=O)CC1N=CNC=1)=O.Cl.[OH-:43].[Na+].C(C(O)(C([O-])=O)CC([O-])=O)C([O-])=O.C(C(O)(C([O-])=O)CC([O-])=O)C([O-])=O.[OH2:71].[Na+].[Na+].[Na+].[K+].[K+].[K+].C1C=C2C(C(O)(O)C(=O)C2=CC=1)=O.N(CC(N[C@H](C(O)=O)CC1N=CNC=1)=O)C(N)=N.Cl>O.N1C=CC=CC=1>[NH:12]([CH2:8][C:9]([OH:71])=[O:43])[C:11]([NH2:10])=[NH:27].[NH2:5][C@H:6]([C:13]([OH:15])=[O:14])[CH2:7][C:8]1[N:12]=[CH:11][NH:10][CH:9]=1参加物
反応物 9
生成物 2
試薬・触媒・溶媒 2
実験手順
H2O (n=1) was prepared from glycyl-L-histidine and S-ethylisothiourea.H2SO4. Solutions of 1.50 g. of S-ethylisothiourea.H2SO4 in 5 ml of H2O and 1.74 g. of Gly-His.HCl in 3 ml of H2O were adjusted to pH 8-9 with 4 N NaOH. They were then mixed and kept at room temperature for a week. The cloudy suspension was filtered and the filtrate concentrated to dryness in vacuo. The residue, after addition of a small amount of EtOH, was dried in vacuo. A small amount of H2O was added to dissolve the dry residue and resulting solution was poured onto the column (2.5 cm i.d. × 30 cm Amberlite CG-120, 200-400 mesh, pyridine form). H2O, 1.0 M pyridine, 2.0 M pyridine, and 1.0 M pyridine--0.5 M NH4OH were used as the effluent solutions. Each fraction was tested for ninhydrin, Pauli, and Sakaguchi reactions. The fractions containing guanidinoacetyl-L-histidine were pooled and concentrated to dryness in vacuo. Cryst from H2O--EtOH; yield, 69.2%; mp, 108-111° C., decomp. Hydrolysis (6 N HCl, 110° , 24 hours.) gave guanidinoacetic acid and histidine, as confirmed be tlc. (thin layer chromatography).
後処理
- additionThey were then mixed
- waitkept at room temperature for a week
- filtrationThe cloudy suspension was filtered
- concentrationthe filtrate concentrated to dryness in vacuo
- additionThe residue, after addition of a small amount of EtOH
- customwas dried in vacuo
- additionA small amount of H2O was added
- dissolutionto dissolve the dry residue
- customresulting solution
- concentrationconcentrated to dryness in vacuo
- customyield
出典と根拠
- ORDレコード
- ord-f481a805934f4387a2abd702b14ad33c
- 出典データセット
- uspto-grants-1976_11
- 特許番号
- US03995051
関連ノート
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