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Hydrochloric Acid → 3-Methoxynaphthalene-2-boronic acid

HRID 657182
ノート
印刷プレビュー

反応式

HRID 657182 の反応式
[CH3:1][O:2][C:3]1[CH:12]=[CH:11][C:10]2[C:5](=[CH:6][CH:7]=[CH:8][CH:9]=2)[CH:4]=1.C([Li])CCC.[B:18](OC)([O:21]C)[O:19]C.Cl>O1CCCC1.C(Cl)(Cl)Cl>[CH3:1][O:2][C:3]1[C:12]([B:18]([OH:21])[OH:19])=[CH:11][C:10]2[C:5]([CH:4]=1)=[CH:6][CH:7]=[CH:8][CH:9]=2
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

7

反応物 4

HCID 313Hydrochloric AcidHCID 71192-MethoxynaphthaleneHCID 8470Trimethyl borateHCID 178418339Butyllithium

生成物 1

HCID 108889523-Methoxynaphthalene-2-boronic acid収率 25.1%

試薬・触媒・溶媒 2

HCID 6212Chloroform溶媒
HCID 8028
Tetrahydrofuran
溶媒

反応条件

温度
0 °C

実験手順

Under a nitrogen atmosphere, 15.0 g (94.9 mmol) of 2-methoxynaphthalene was dissolved in tetrahydrofuran (300 ml), and the solution was cooled to 0° C. After that, 238 mL (1.6-mol/L solution, 190 mmol) of normal butyllithium were slowly dropped to the solution. After the dropping, the mixture was stirred at 0° C. for 2 hours. After that, the mixture was cooled to −10° C., and 33 mL (340 mmol) of trimethyl borate was dropped over 10 minutes to the mixture. The resultant was heated to room temperature, and was stirred overnight. After that, 0.2N hydrochloric acid was added to the resultant to stop the reaction. Chloroform was added to the resultant to separate an organic layer, and the layer was washed with a saturated aqueous solution of ammonium chloride once and with water four times. After that, the solvent was removed by distillation, and heptane and toluene were added to the resultant residue to purify the residue by recrystallization, whereby 4.81 g of Intermediate Compound 6 were obtained.

後処理

  1. temperatureAfter that, the mixture was cooled to −10° C.
  2. temperatureThe resultant was heated to room temperature
  3. stirringwas stirred overnight
  4. customthe reaction
  5. customto separate an organic layer
  6. washthe layer was washed with a saturated aqueous solution of ammonium chloride once
  7. customAfter that, the solvent was removed by distillation, and heptane and toluene
  8. additionwere added to the resultant residue
  9. customto purify the residue
  10. customby recrystallization

出典と根拠

ORDレコード
ord-13bce3e810154d09b9a219ae1fb2d8c5
出典データセット
uspto-grants-2011_12
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08072137B2

反応ノート

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