反応式
C1COCC1.[C:6]([OH:11])(=[O:10])[C:7]([CH3:9])=[CH2:8].[C:12]([O:17][CH2:18][CH2:19][CH2:20][OH:21])(=[O:16])[C:13]([CH3:15])=[CH2:14]>C(C(OC(CC)(CC)C)(CC)C)C.CC(N=NC(C#N)(C)C)(C#N)C>[C:6]([OH:11])(=[O:10])[C:7]([CH3:9])=[CH2:8].[C:12]([O:17][CH2:18][CH2:19][CH2:20][OH:21])(=[O:16])[C:13]([CH3:15])=[CH2:14]参加物
6
実験手順
To 20 g of THF were added 9 g of methacrylic acid, 1 g of hydroxypropyl methacrylate, and 0.1 g of AIBN. The resulting mixture was reacted at 67° C. for 3 hours. After reaction, the resulting solution was dropped in diethylethyl ether, thereby obtaining 9.3 g of a photoresist polymer of Formula (IVd).
後処理
- customThe resulting mixture was reacted at 67° C. for 3 hours
- customAfter reaction
出典と根拠
- ORDレコード
- ord-a4dcbc86eb9c458dae976a088d9d0c1d
- 出典データセット
- uspto-grants-2008_07
- 特許番号
- US07399570B2
関連ノート
読み込み中…