1-Hydroxybenzotriazole → 7-{2-[2-(tert-Butyldimethylsilanyloxy)ethoxy]thiazol-5-yl}-6-[cyclo-propyl-(2,3-dichlorobenzyl)carbamoyl]-3,9-diazabicyclo[3.3.1]non-6-ene-3,9-dicarboxylic acid di-tert-butyl ester

HRID 1096853노트

반응식

HRID 1096853 반응식
[C:1]([O:5][C:6]([N:8]1[CH2:15][CH:14]2[N:16]([C:17]([O:19][C:20]([CH3:23])([CH3:22])[CH3:21])=[O:18])[CH:10]([CH2:11][C:12]([C:27]3[S:31][C:30]([O:32][CH2:33][CH2:34][O:35][Si:36]([C:39]([CH3:42])([CH3:41])[CH3:40])([CH3:38])[CH3:37])=[N:29][CH:28]=3)=[C:13]2[C:24](O)=[O:25])[CH2:9]1)=[O:7])([CH3:4])([CH3:3])[CH3:2].C1C=CC2N(O)N=NC=2C=1.CCN=C=NCCCN(C)C.Cl.CCN(C(C)C)C(C)C.[CH:74]1([NH:77][CH2:78][C:79]2[CH:84]=[CH:83][CH:82]=[C:81]([Cl:85])[C:80]=2[Cl:86])[CH2:76][CH2:75]1>C(Cl)Cl.CN(C1C=CN=CC=1)C>[C:1]([O:5][C:6]([N:8]1[CH2:15][CH:14]2[N:16]([C:17]([O:19][C:20]([CH3:23])([CH3:22])[CH3:21])=[O:18])[CH:10]([CH2:11][C:12]([C:27]3[S:31][C:30]([O:32][CH2:33][CH2:34][O:35][Si:36]([C:39]([CH3:41])([CH3:42])[CH3:40])([CH3:38])[CH3:37])=[N:29][CH:28]=3)=[C:13]2[C:24](=[O:25])[N:77]([CH:74]2[CH2:75][CH2:76]2)[CH2:78][C:79]2[CH:84]=[CH:83][CH:82]=[C:81]([Cl:85])[C:80]=2[Cl:86])[CH2:9]1)=[O:7])([CH3:4])([CH3:3])[CH3:2]

참가 물질

8

실험 절차

A sol. of compound D4 (1.39 mmol, 0.87 g) in CH2Cl2 (11.2 mL) was treated with DMAP (0.35 mmol, 42 mg), HOBt (1.67 mmol, 0.23 g), EDC.HCl (3.47 mmol, 0.66 g), and DIPEA (5.55 mmol, 0.95 mL). After 30 min at rt, cyclopropyl-(2,3-dichlorobenzyl)-amine (prepared by reductive amination from 2,3-dichlorobenzaldeyhde and cyclopropylamine; 4.16 mmol, 0.90 g) was added and the mixture was stirred for 4 days at rt. The reaction was then diluted with CH2Cl2 (40 mL), washed with aq. 1M HCl (2×50 mL), dried over MgSO4, filtered, and the solvents were removed under reduced pressure. Purification of the residue by FC (EtOAc/heptane 30:70) yielded the title compound (0.48 g, 42%). LC-MS: tR=1.29 min; ES+: 823.50.

후처리

  1. washwashed with aq. 1M HCl (2×50 mL)
  2. dry with materialdried over MgSO4
  3. filtrationfiltered
  4. customthe solvents were removed under reduced pressure
  5. customPurification of the residue by FC (EtOAc/heptane 30:70)

출처 및 근거

ORD 기록
ord-0346bf2d8d6148dabb7ab34322d75cf4
출처 데이터셋
uspto-grants-2012_03
특허 번호
US08138340B2

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