반응식
C1(P(C2C=CC=CC=2)C2C=CC=CC=2)C=CC=CC=1.Br[C:21]1[N:29]2[C:24]([CH:25]=[N:26][C:27]([S:30][CH3:31])=[N:28]2)=[CH:23][CH:22]=1.Cl.[NH2:33][C:34]1[CH:35]=[C:36](B(O)O)[CH:37]=[CH:38][CH:39]=1.C(=O)([O-])[O-].[Na+].[Na+].Cl>O1CCCC1.C(O)C.O.C([O-])(=O)C.[Pd+2].C([O-])(=O)C>[CH3:31][S:30][C:27]1[N:26]=[CH:25][C:24]2=[CH:23][CH:22]=[C:21]([C:38]3[CH:39]=[C:34]([NH2:33])[CH:35]=[CH:36][CH:37]=3)[N:29]2[N:28]=1참가 물질
반응물 5
생성물 1
시약·촉매·용매 4
실험 절차
Palladium Acetate (0.37 g, 0.0016 mol) and Triphenylphosphine (0.54 g, 0.0020 mol) were dissolved in Tetrahydrofuran (25 mL) and the mixture was allowed to stir at room temperature for 10 minutes. 7-Bromo-2-methylsulfanyl-pyrrolo[2,1-f][1,2,4]triazine (1.95 g, 0.00799 mol) and 3-Aminophenylboronic acid hydrochloride (2.84 g, 0.0164 mol) were added followed by 2.00 M of Sodium carbonate in Water (20.0 mL, 0.0400 mol) and Ethanol (25 mL). The reaction mixture was then heated at 75° C. and was allowed to stir overnight. The reaction mixture was diluted with water (40 mL), cooled and acidified with 12M HCl, then washed twice with EtOAc (50 mL). The org. wash was extracted with 3M HCl (3×30 mL) and the combined aq. extr. washed with EtOAc (2×50 mL). The aq. was then basified with 5N NaOH to pH 9, then extracted with DCM (4×30 mL). The DCM extr. was washed with brine (50 mL) and dried over sodium sulfate before conc. in vacuo. The residue was applied to a 25 g ISCO preload cartridge and purified on the ISCO (40 g, 5-40% EtOAc:Hex). Clean product was isolated from select fractions to afford 3-(2-Methylsulfanyl-pyrrolo[2,1-f][1,2,4]triazin-7-yl)-phenylamine (0.80 g, 39%).
후처리
- temperatureThe reaction mixture was then heated at 75° C.
- stirringto stir overnight
- temperaturecooled
- washwashed twice with EtOAc (50 mL)
- washwash
- extractionwas extracted with 3M HCl (3×30 mL)
- washwashed with EtOAc (2×50 mL)
- extractionextracted with DCM (4×30 mL)
- washwas washed with brine (50 mL)
- dry with materialdried over sodium sulfate before conc. in vacuo
- custompurified on the ISCO (40 g, 5-40% EtOAc:Hex)
- customClean product was isolated from select fractions
출처 및 근거
- ORD 기록
- ord-70b54cd2ca4941d1a9f7d5639a0d0cbd
- 출처 데이터셋
- uspto-grants-2013_06
- 특허 번호
- US08471005B2
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