Trichlorosilane → Phenyltrichlorosilane

반응식

[C:1]1([Si:7](C)([CH3:9])[CH3:8])[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.[Cl:11][SiH:12]([Cl:14])[Cl:13]>>[C:1]1([Si:12]([Cl:14])([Cl:13])[Cl:11])[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.[CH3:1][SiH:7]([CH3:9])[CH3:8]

참가 물질

반응물 2

HCID 24811Trichlorosilane

HCID 69849Phenyltrimethylsilane

생성물 2

HCID 7372Phenyltrichlorosilane

HCID 70435Trimethylsilane

실험 절차

Eaborn et al., J. Organometal. Chem. 4:489 (1965), describes a process where phenyltrimethylsilane and trichlorosilane are reacted at 500° C. in the gas phase to give phenyltrichlorosilane and trimethylsilane.

후처리

customare reacted at 500° C. in the gas phase

출처 및 근거

ORD 기록: ord-397cbff1d1554549bf8f1536e696e65f
출처 데이터셋: uspto-grants-1992_06
DOI: 10.6084/m9.figshare.5104873.v1
특허 번호: US05126472

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