Dimethylformamide → HCID 178522861, compound
Reaction equation
[Cl:1][C:2]1[CH:23]=[CH:22][C:5]([CH2:6][NH:7][C:8]([C:10]2[CH:11]=[N:12][C:13]3[C:18]([C:19]=2[OH:20])=[CH:17][C:16](I)=[CH:15][CH:14]=3)=[O:9])=[CH:4][CH:3]=1.CN(C=O)C.[CH2:29]([OH:32])[C:30]#[CH:31]>N(CC)CC.[Cu]I.Cl[Pd](Cl)([P](C1C=CC=CC=1)(C1C=CC=CC=1)C1C=CC=CC=1)[P](C1C=CC=CC=1)(C1C=CC=CC=1)C1C=CC=CC=1>[Cl:1][C:2]1[CH:23]=[CH:22][C:5]([CH2:6][NH:7][C:8]([C:10]2[CH:11]=[N:12][C:13]3[C:18]([C:19]=2[OH:20])=[CH:17][C:16]([C:31]#[C:30][CH2:29][OH:32])=[CH:15][CH:14]=3)=[O:9])=[CH:4][CH:3]=1Participants
Reactant 3
Product 1
Reagents, catalysts & solvents 3
Procedure
To a mixture of N-(4-chlorobenzyl)-4-hydroxy-6-iodo-3-quinolinecarboxamide from Preparation No. 4 (0.494 g) in Et2NH (12.9 mL) is added CuI (10.8 mg) and (Ph3P)2PdCl2 (39.7 mg). DMF (2 mL) is added to solubilize the reactants. To this solution is added propargyl alcohol (0.066 mL) and the reaction is stirred at room temperature for 2 days. The reaction mixture is concentrated to remove Et2NH. The resulting residue is partitioned between CH2Cl2 (3×) and H2O. A brown solid precipitated from the CH2Cl2 layer is filtered and collected to obtain pure product as indicated by NMR. The organic layers are combined, dried over Na2SO4, and concentrateed to obtain a brown residue. The residue is placed under high vac to remove residual DMF. The residue is adsorbed onto silica and chromatographed eluting with 2% MeOH in CH2C12 and 3% MeOH in CH2Cl2. Fractions homogenous by TLC are combined, condensed and recrystallized with EtOAc/hexanes to obtain a creme solid. The two crops yielded 325.4 mg (79%) of the desired product as a tan solid.
Workup
- customfrom Preparation No
- concentrationThe reaction mixture is concentrated
- customto remove Et2NH
- customThe resulting residue is partitioned between CH2Cl2 (3×) and H2O
- customA brown solid precipitated from the CH2Cl2 layer
- filtrationis filtered
- customcollected
- customto obtain pure product
- dry with materialdried over Na2SO4
- customto obtain a brown residue
- customto remove residual DMF
- customchromatographed
- washeluting with 2% MeOH in CH2C12 and 3% MeOH in CH2Cl2
- customcondensed
- customrecrystallized with EtOAc/hexanes
- customto obtain a creme solid
Sources & evidence
- ORD record
- ord-d2fa7fddd5c74293be96ed88e2eafea0
- Source dataset
- uspto-grants-2001_06
- Patent number
- US06248739B1
Reaction notes
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