Trifluoroacetic acid → HCID 59557146, compound
Reaction equation
[Br:1][C:2]1[CH:13]=[CH:12][C:5]([NH:6][CH2:7][C:8]([F:11])([F:10])[F:9])=[C:4]([C:14]([F:17])([F:16])[F:15])[CH:3]=1.Br[CH2:19][C:20]([O:22]C(C)(C)C)=[O:21].[SiH](CC)(CC)CC.C(O)(C(F)(F)F)=O>CN(C=O)C.O>[Br:1][C:2]1[CH:13]=[CH:12][C:5]([N:6]([CH2:7][C:8]([F:11])([F:10])[F:9])[CH2:19][C:20]([OH:22])=[O:21])=[C:4]([C:14]([F:15])([F:16])[F:17])[CH:3]=1Participants
Reactant 4
Product 1
Reagents, catalysts & solvents 2
Procedure
To a slurry of hexanes-washed NaH (0.492 g of a 60% w/w suspension in mineral oil, 12.3 mmol) in dry DMF (10 mL) at 0° C. was added a solution of 4-bromo-N-(2,2,2-trifluoroethyl)-2-(trifluoromethyl)aniline (1.96 g, 6.13 mmol) in DMF (2 mL), dropwise over 5 min. The mixture was stirred 15 min and tert-butyl bromoacetate (1.82 mL, 12.3 mmol) was added dropwise over 1 min. The mixture was stirred overnight, slowly warming to rt. The mixture was poured into water and the whole was extracted with Et2O (×3). Combined organic portions were washed (water, brine), dried over Na2SO4, filtered and concentrated. The residue was dissolved in CH2Cl2 (20 mL) and to this solution was added Et3SiH (4.9 mL, 31 mmol) and TFA (20 mL). The mixture was stirred 1.5 h at rt and concentrated in vacuo. The residue was partitioned between water/Et2O and the layers were separated. The organic layer was concentrated in vacuo. The residue was purified by filtration through a pad of silica gel (10% EtOAc/hexanes, then EtOAc to elute carboxylic acid) affording 1.50 g of the title compound as a pale yellow solid: MS (APCI) m/z 380 ([M−H]−, 81Br), 378 ([M−H]−, 79Br).
Workup
- washTo a slurry of hexanes-washed NaH (0.492 g of a 60% w/w suspension in mineral oil, 12.3 mmol) in dry DMF (10 mL) at 0° C.
- stirringThe mixture was stirred overnight
- extractionthe whole was extracted with Et2O (×3)
- washCombined organic portions were washed (water, brine)
- dry with materialdried over Na2SO4
- filtrationfiltered
- concentrationconcentrated
- dissolutionThe residue was dissolved in CH2Cl2 (20 mL) and to this solution
- stirringThe mixture was stirred 1.5 h at rt
- concentrationconcentrated in vacuo
- customThe residue was partitioned between water/Et2O
- customthe layers were separated
- concentrationThe organic layer was concentrated in vacuo
- filtrationThe residue was purified by filtration through a pad of silica gel (10% EtOAc/hexanes
- washEtOAc to elute carboxylic acid)
Sources & evidence
- ORD record
- ord-1dbc986160284b9eb5ee670356209141
- Source dataset
- uspto-grants-2010_11
- Patent number
- US07834063B2
Reaction notes
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