Trifluoroacetic acid → HCID 59557146, compound

HRID 1173470Notes

Reaction equation

HRID 1173470 reaction equation
[Br:1][C:2]1[CH:13]=[CH:12][C:5]([NH:6][CH2:7][C:8]([F:11])([F:10])[F:9])=[C:4]([C:14]([F:17])([F:16])[F:15])[CH:3]=1.Br[CH2:19][C:20]([O:22]C(C)(C)C)=[O:21].[SiH](CC)(CC)CC.C(O)(C(F)(F)F)=O>CN(C=O)C.O>[Br:1][C:2]1[CH:13]=[CH:12][C:5]([N:6]([CH2:7][C:8]([F:11])([F:10])[F:9])[CH2:19][C:20]([OH:22])=[O:21])=[C:4]([C:14]([F:15])([F:16])[F:17])[CH:3]=1

Participants

7

Procedure

To a slurry of hexanes-washed NaH (0.492 g of a 60% w/w suspension in mineral oil, 12.3 mmol) in dry DMF (10 mL) at 0° C. was added a solution of 4-bromo-N-(2,2,2-trifluoroethyl)-2-(trifluoromethyl)aniline (1.96 g, 6.13 mmol) in DMF (2 mL), dropwise over 5 min. The mixture was stirred 15 min and tert-butyl bromoacetate (1.82 mL, 12.3 mmol) was added dropwise over 1 min. The mixture was stirred overnight, slowly warming to rt. The mixture was poured into water and the whole was extracted with Et2O (×3). Combined organic portions were washed (water, brine), dried over Na2SO4, filtered and concentrated. The residue was dissolved in CH2Cl2 (20 mL) and to this solution was added Et3SiH (4.9 mL, 31 mmol) and TFA (20 mL). The mixture was stirred 1.5 h at rt and concentrated in vacuo. The residue was partitioned between water/Et2O and the layers were separated. The organic layer was concentrated in vacuo. The residue was purified by filtration through a pad of silica gel (10% EtOAc/hexanes, then EtOAc to elute carboxylic acid) affording 1.50 g of the title compound as a pale yellow solid: MS (APCI) m/z 380 ([M−H]−, 81Br), 378 ([M−H]−, 79Br).

Workup

  1. washTo a slurry of hexanes-washed NaH (0.492 g of a 60% w/w suspension in mineral oil, 12.3 mmol) in dry DMF (10 mL) at 0° C.
  2. stirringThe mixture was stirred overnight
  3. extractionthe whole was extracted with Et2O (×3)
  4. washCombined organic portions were washed (water, brine)
  5. dry with materialdried over Na2SO4
  6. filtrationfiltered
  7. concentrationconcentrated
  8. dissolutionThe residue was dissolved in CH2Cl2 (20 mL) and to this solution
  9. stirringThe mixture was stirred 1.5 h at rt
  10. concentrationconcentrated in vacuo
  11. customThe residue was partitioned between water/Et2O
  12. customthe layers were separated
  13. concentrationThe organic layer was concentrated in vacuo
  14. filtrationThe residue was purified by filtration through a pad of silica gel (10% EtOAc/hexanes
  15. washEtOAc to elute carboxylic acid)

Sources & evidence

ORD record
ord-1dbc986160284b9eb5ee670356209141
Source dataset
uspto-grants-2010_11
Patent number
US07834063B2

Reaction notes

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