Triethylsilane → HCID 16117411, compound

HRID 1714135Notes

Reaction equation

HRID 1714135 reaction equation
[Cl:1][C:2]1[CH:7]=[C:6]([Cl:8])[CH:5]=[CH:4][C:3]=1[C:9]1[CH:10]=[C:11]2[C:19](=[CH:20][CH:21]=1)[C:18](=O)[C@H:17]1[C@@H:12]2[CH2:13][NH:14][CH2:15][CH2:16]1.[SiH](CC)(CC)CC>FC(F)(F)C(O)=O>[Cl:1][C:2]1[CH:7]=[C:6]([Cl:8])[CH:5]=[CH:4][C:3]=1[C:9]1[CH:10]=[C:11]2[C:19](=[CH:20][CH:21]=1)[CH2:18][C@H:17]1[C@@H:12]2[CH2:13][NH:14][CH2:15][CH2:16]1

Participants

4

Reactant 2

HCID 12052TriethylsilaneHCID 16117410HCID 16117410, compound

Product 1

HCID 16117411HCID 16117411, compound

Reagents, catalysts & solvents 1

HCID 6422Trifluoroacetic acidSolvent

Conditions

Temperature
20 °C

Procedure

To a solution of cis-6-(2,4-dichloro-phenyl)-1,2,3,4,4a,9a-hexahydro-3-aza-fluoren-9-one (40 mg, 0.12 mmol) in trifluoroacetic acid (2.0 mL) was added Et3SiH (62 mg, 0.53 mmol). The reaction mixture was stirred at 20° C. for 15 h then concentrated in vacuo. The residue was basified with NH4OH then extracted with CH2Cl2. The organic layer was dried over MgSO4, filtered and concentrated in vacuo to give the crude title compound.

Workup

  1. concentrationthen concentrated in vacuo
  2. extractionthen extracted with CH2Cl2
  3. dry with materialThe organic layer was dried over MgSO4
  4. filtrationfiltered
  5. concentrationconcentrated in vacuo

Sources & evidence

ORD record
ord-66c2ec3ec4f548f88cac2f0d907cf2f1
Source dataset
uspto-grants-2010_09
Patent number
US07795436B2

Reaction notes

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