Hydrochloric Acid → HCID 20096777, compound

HRID 1769584Notes

Reaction equation

HRID 1769584 reaction equation
[H-].[Al+3].[Li+].[H-].[H-].[H-].[F:7][C:8]1[CH:9]=[C:10]([CH2:16][CH2:17]OC(CC2CCCCC2)=O)[CH:11]=[C:12]([F:15])[C:13]=1[F:14].C([O:31][CH2:32][CH3:33])(=O)C.Cl>C1COCC1>[F:15][C:12]1[CH:11]=[C:10]([CH:16]2[CH2:17][CH2:12][CH:13]([CH2:33][CH2:32][OH:31])[CH2:8][CH2:9]2)[CH:9]=[C:8]([F:7])[C:13]=1[F:14]

Participants

6

Reactant 4

HCID 313Hydrochloric AcidHCID 8857Ethyl AcetateHCID 21226445Aluminium lithium hydrideHCID 67588885HCID 67588885, compound

Product 1

HCID 20096777HCID 20096777, compound

Reagents, catalysts & solvents 1

HCID 8028TetrahydrofuranSolvent

Procedure

Lithiumaluminium hydride (2.2 g) was added to a solution of 4-(3',4',5'-trifluorophenyl)ethoxycarbonylmethylcyclohexane (17.2 g) in THF (100 ml), followed by stirring the mixture at room temperature for 2 hours, adding ethyl acetate (100 ml) little by little after completion of the reaction, further adding 2N hydrochloric acid (50 ml), washing the organic layer with water, drying over anhydrous MgSO4 and concentrating the solvent under reduced pressure, to obtain 4-(3',4',5'-trifluorophenyl)-1-(2'hydroxyethyl)cyclohexane (10.4 g).

Workup

  1. customlittle after completion of the reaction
  2. washwashing the organic layer with water
  3. dry with materialdrying over anhydrous MgSO4
  4. concentrationconcentrating the solvent under reduced pressure

Sources & evidence

ORD record
ord-61b702d73f1f405da3376180c5d5c902
Source dataset
uspto-grants-1995_01
Patent number
US05382379

Reaction notes

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