Hydrochloric Acid → HCID 69894511, compound

HRID 1838758Notes

Reaction equation

HRID 1838758 reaction equation
C(OC([NH:8][CH2:9][C:10]1[CH:66]=[CH:65][C:13]([CH2:14][NH:15][C:16]([N:18]2[CH2:23][CH2:22][N:21]([C:24](=[O:64])[CH2:25][N:26]3[CH2:33][CH2:32][C:31](=[O:34])[N:30]([CH2:35][C:36](=[O:62])[N:37]4[CH2:42][CH2:41][N:40]([C:43]([NH:45][CH2:46][C:47]5[CH:52]=[CH:51][C:50]([CH2:53][NH:54]C(OC(C)(C)C)=O)=[CH:49][CH:48]=5)=[O:44])[CH2:39][CH2:38]4)[CH2:29][CH2:28][C:27]3=[O:63])[CH2:20][CH2:19]2)=[O:17])=[CH:12][CH:11]=1)=O)(C)(C)C.FC(F)(F)C(O)=O.[ClH:74]>ClCCl.O1CCOCC1>[ClH:74].[ClH:74].[NH2:8][CH2:9][C:10]1[CH:11]=[CH:12][C:13]([CH2:14][NH:15][C:16]([N:18]2[CH2:23][CH2:22][N:21]([C:24](=[O:64])[CH2:25][N:26]3[CH2:33][CH2:32][C:31](=[O:34])[N:30]([CH2:35][C:36](=[O:62])[N:37]4[CH2:42][CH2:41][N:40]([C:43]([NH:45][CH2:46][C:47]5[CH:48]=[CH:49][C:50]([CH2:53][NH2:54])=[CH:51][CH:52]=5)=[O:44])[CH2:39][CH2:38]4)[CH2:29][CH2:28][C:27]3=[O:63])[CH2:20][CH2:19]2)=[O:17])=[CH:65][CH:66]=1

Participants

6

Reactant 3

HCID 313Hydrochloric AcidHCID 6422Trifluoroacetic acidHCID 60060022HCID 60060022, compound2×

Product 1

HCID 69894511HCID 69894511, compound

Reagents, catalysts & solvents 2

HCID 6344DichloromethaneSolventHCID 312751,4-DioxaneSolvent

Procedure

0.2 g of 1,5-bis-{2-[4-(4-tert-butyloxycarbonylaminomethylbenzylaminocarbonyl)piperazin-1-yl]-2-oxoethyl}-perhydro-1,5-diazocin-2,6-dione (starting material A1) is suspended in 2 ml of dichloromethane and then admixed with 2 ml of trifluoroacetic acid. The mixture is stirred at RT overnight, and 2 ml of a solution of HCl in dioxane are then added. The mixture is concentrated to dryness using a rotary evaporator. The residue is twice triturated with ether and the solvent decanted off. The residue is then dried under high vacuum. This gives 0.17 g of the title compound of m.p. from 90° C. (decomposition). The mass spectrum shows the molecular peak MH+ at 719 Da.

Workup

  1. concentrationThe mixture is concentrated to dryness
  2. customa rotary evaporator
  3. customThe residue is twice triturated with ether
  4. customthe solvent decanted off
  5. customThe residue is then dried under high vacuum

Sources & evidence

ORD record
ord-fe7fa8caafeb443ea7e62a4fc40354b9
Source dataset
uspto-grants-2004_01
Patent number
US06673786B1

Reaction notes

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