Trifluoroacetic acid → HCID 86644904, compound
Reaction equation
CN(C(ON1N=NC2C=CC=NC1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.CCN(C(C)C)C(C)C.[NH2:34][CH2:35][C:36]1[C:37]([F:53])=[C:38]([O:43][C:44]2[CH:45]=[C:46]([CH:49]=[C:50]([Cl:52])[CH:51]=2)[C:47]#[N:48])[C:39]([Cl:42])=[CH:40][CH:41]=1.C[Si](C)(C)CCOC[N:60]1[C:64]2[CH:65]=[C:66]([C:68](O)=[O:69])[NH:67][C:63]=2[N:62]=[CH:61]1.[C:73]([OH:79])([C:75]([F:78])([F:77])[F:76])=[O:74]>CN(C=O)C.C(Cl)Cl>[F:76][C:75]([F:78])([F:77])[C:73]([OH:79])=[O:74].[Cl:42][C:39]1[CH:40]=[CH:41][C:36]([CH2:35][NH:34][C:68]([C:66]2[NH:67][C:63]3[N:62]=[CH:61][NH:60][C:64]=3[CH:65]=2)=[O:69])=[C:37]([F:53])[C:38]=1[O:43][C:44]1[CH:45]=[C:46]([C:47]#[N:48])[CH:49]=[C:50]([Cl:52])[CH:51]=1Participants
Reactant 5
Product 1
Reagents, catalysts & solvents 2
Procedure
HATU (0.092 g, 0.241 mmol) was added to a solution of DIPEA (0.042 ml, 0.241 mmol), 3-{[3-(aminomethyl)-6-chloro-2-fluorophenyl]oxy}-5-chlorobenzonitrile (0.050 g, 0.161 mmol) and 1-({[2-(trimethylsilyl)ethyl]oxy}methyl)-1,4-dihydropyrrolo[2,3-d]imidazole-5-carboxylic acid (0.045 g, 0.161 mmol) dissolved in DMF (2 ml). The resulting solution was stirred overnight. The reaction mixture was partitioned between water and EtOAc. The organic layer was separated, dried over MgSO4 and evaporated to a residue. Purification was accomplished by reverse-phase HPLC (water/acetonitrile with 0.1% TFA) to afford a residue which was dissolved in DCM and TFA. This was stirred until LCMS showed complete removal of the SEM group. The solvent and acid were evaporated and the resulting solid washed with DCM and acetone to afford the title compound (0.0052 g, 6%) as a tan solid. 1H NMR (400 MHz, CD3OD) δ ppm 8.65 (s, 1H), 7.55 (t, 1H), 7.36-7.43 (m, 2H), 7.27 (t, 1H), 7.20 (dd, 1H), 6.95 (s, 1H), 4.63 (s, 2H). 19F NMR (376 MHz, CD3OD) δ ppm −77.52 (s, 3F), −133.01 (s, 1F). LCMS: m/z=442.0 (M−1).
Workup
- customThe reaction mixture was partitioned between water and EtOAc
- customThe organic layer was separated
- dry with materialdried over MgSO4
- customevaporated to a residue
- customPurification
- customto afford a residue which
- stirringThis was stirred until LCMS
- customremoval of the SEM group
- customThe solvent and acid were evaporated
- washthe resulting solid washed with DCM and acetone
Sources & evidence
- ORD record
- ord-d3b73530b7b04ee089bf00298c9c538c
- Source dataset
- uspto-grants-2012_11
- Patent number
- US08304419B2
Reaction notes
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