Hydrochloric Acid → HCID 54768029, compound
Reaction equation
[CH2:1]([C:3]1[CH:8]=[CH:7][C:6]([NH:9][C:10]2[O:11][C:12]3[CH:18]=[CH:17][C:16]([NH2:19])=[CH:15][C:13]=3[N:14]=2)=[CH:5][CH:4]=1)[CH3:2].[C:20]1([CH2:26][C:27](Cl)=[O:28])[CH:25]=[CH:24][CH:23]=[CH:22][CH:21]=1.C(N(CC)C(C)C)(C)C.Cl>CN(C=O)C>[CH2:1]([C:3]1[CH:4]=[CH:5][C:6]([NH:9][C:10]2[O:11][C:12]3[CH:18]=[CH:17][C:16]([NH:19][C:27](=[O:28])[CH2:26][C:20]4[CH:25]=[CH:24][CH:23]=[CH:22][CH:21]=4)=[CH:15][C:13]=3[N:14]=2)=[CH:7][CH:8]=1)[CH3:2]Participants
6
Reactant 4
Product 1
Reagents, catalysts & solvents 1
Procedure
The compound 1 prepared in Example 1 (1 mmol, 1 eq) was dissolved with DMF (dimethylformamide, 3 mL), and 2-phenylacetyl chloride (1 mmol, 1 eq) and N,N-diisopropylethylamine (1 mmol, 1 eq) were added together thereto. The mixture was then stirred at room temperature for 16 hours. To the reaction solution was added 10% aqueous HCl solution, and the mixture was extracted with 30 mL of EtOAc. The organic layer was washed with 10% aqueous HCl solution, and then two times with saturated NaHCO3 solution and two times with saturated aqueous NaCl solution. After drying with anhydrous MgSO4 and filtering under reduced pressure, the organic solvent was removed under reduced pressure to prepare the title compound.
Workup
- additionwere added together
- extractionthe mixture was extracted with 30 mL of EtOAc
- washThe organic layer was washed with 10% aqueous HCl solution
- dry with materialAfter drying with anhydrous MgSO4
- filtrationfiltering under reduced pressure
- customthe organic solvent was removed under reduced pressure
- customto prepare the title compound
Sources & evidence
- ORD record
- ord-7b780679f3ab4ca2b0413b41336ee981
- Source dataset
- uspto-grants-2013_12
- Patent number
- US08614240B2
Reaction notes
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