Dimethylformamide → cis-2-(4-Bromobenzoyl)cyclopentanecarboxylic acid methyl ester

HRID 30864Notes

Reaction equation

HRID 30864 reaction equation
O=S(Cl)Cl.CN([CH:8]=[O:9])C.[Br:10][C:11]1[CH:16]=[CH:15][CH:14]=[CH:13][CH:12]=1.[Al+3].[Cl-].[Cl-].[Cl-].C[CH2:22][O:23][C:24]([CH3:26])=[O:25]>C(Cl)Cl>[CH3:22][O:23][C:24]([C@@H:26]1[CH2:13][CH2:12][CH2:11][C@@H:16]1[C:8](=[O:9])[C:14]1[CH:15]=[CH:16][C:11]([Br:10])=[CH:12][CH:13]=1)=[O:25]

Participants

7

Procedure

A solution of the monomethyl ester (92.0 g, 534.3 mmol), SOCl2 (116.3 mL, 1.60 mol), and DMF (1 mL) in 850 mL CH2Cl2 was stirred at rt overnight under N2. NMR analysis showed little starting material remaining. The solvent was removed by rotary evaporation at <40° C., and the residue was dried in vacuo for 1 h. This dried residue was dissolved in bromobenzene (337.6 mL, 3.2 mol), and AlCl3 (142.5 g, 1.07 mol) was then added portionwise at <5° C. The reaction mixture turned dark brown, and was stirred at <5° C. for 4 h under N2. NMR analysis then showed little starting material remaining. The reaction mixture was then slowly poured into 2 L ice-water, and then 1 L EtOAc was added. After the mixture was stirred for 10 minutes, the aqueous (top) layer was separated, and extracted with 500 mL EtOAc. The combined organic layers were washed with water (2×1 L) and saturated NaHCO3 solution (200 mL), and dried over Na2SO4. Removal of solvent and drying in vacuo provided 175.0 g (>95%) of the desired product. 1H NMR (CDCl3) δ 7.80 (d, 2H), 7.60 (d, 2H), 4.07 (m, 1H), 3.53 (s, 3H), 3.07 (m, 1H), 2.20 (m, 1H), 2.00 (m, 4H), 1.70 (m, 1H).

Workup

  1. customThe solvent was removed by rotary evaporation at <40° C.
  2. customthe residue was dried in vacuo for 1 h
  3. stirringAfter the mixture was stirred for 10 minutes
  4. customthe aqueous (top) layer was separated
  5. extractionextracted with 500 mL EtOAc
  6. washThe combined organic layers were washed with water (2×1 L) and saturated NaHCO3 solution (200 mL)
  7. dry with materialdried over Na2SO4
  8. customRemoval of solvent
  9. customdrying in vacuo

Sources & evidence

ORD record
ord-fefbea6feb514deb98d3e37d5544f7fa
Source dataset
uspto-grants-2008_09
Patent number
US07423156B2

Reaction notes

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