Reaktionsgleichung
[CH3:1][O:2][C:3](=[O:13])[C:4]1[CH:9]=[CH:8][C:7](I)=[C:6]([O:11][CH3:12])[CH:5]=1.C(Cl)(Cl)Cl.P(C(C)(C)C)(C(C)(C)C)C(C)(C)C.[CH2:31]([Zn]Br)[CH2:32][CH2:33][CH3:34]>CN(C)C=O.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.[Pd].[Pd].O.CCOCC>[CH3:1][O:2][C:3](=[O:13])[C:4]1[CH:9]=[CH:8][C:7]([CH2:31][CH2:32][CH2:33][CH3:34])=[C:6]([O:11][CH3:12])[CH:5]=1Komponenten
9
Edukt 4
Produkt 1
Reagenzien, Katalysatoren, Lösungsmittel 4
Versuchsvorschrift
4-Iodo-3-methoxy-benzoic acid methyl ester (292 mg, 1 mmol) and Pd2(dba)3.CHCl3 (25 mg, 0.025 mmol) and P(tBu)3 (0.25 mL, 10% in hexane, 0.08 mmol) and n-BuZnBr (4 mL, 0.5 M in THF, 2.0 mmol) is mixed in N,N-dimethylformamide (4 mL) together and degassed. After stirring at room temperature for 1 hour, analysis of TLC suggested no starting material left and reaction is stopped. Et2O and H2O were then added and the ether layer is washed with water and dried. After the removal of ether, the residue is directly used in the next step after pass through a short column.
Aufarbeitung
- customdegassed
- waitleft
- customreaction
- washthe ether layer is washed with water
- customdried
- customAfter the removal of ether
Quellen und Nachweise
- ORD-Eintrag
- ord-234feb9bdb2e403eb3608fe74aab6c61
- Quelldatensatz
- uspto-grants-2010_05
- Patentnummer
- US07713994B2
Verknüpfte Notizen
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