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Hydrochloric Acid → 5,6-Dihydro-2H-thiopyran-3-carboxamide

HRID 1053966
Notes
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Reaction equation

HRID 1053966 reaction equation
[S:1]1[CH2:6][CH2:5][CH:4]=[C:3]([C:7]([OH:9])=O)[CH2:2]1.CC[N:12](C(C)C)C(C)C.CN(C(ON1N=NC2C=CC=CC1=2)=[N+](C)C)C.[B-](F)(F)(F)F.C[Si](N[Si](C)(C)C)(C)C.Cl>CN(C=O)C>[S:1]1[CH2:6][CH2:5][CH:4]=[C:3]([C:7]([NH2:12])=[O:9])[CH2:2]1
ParticipantsProcedureWorkupSources & evidenceReaction notes

Participants

7

Reactant 5

HCID 313Hydrochloric AcidHCID 13838HexamethyldisilazaneHCID 81531DiisopropylethylamineHCID 2733207O-(Benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborateHCID 102409305,6-dihydro-2H-thiopyran-3-carboxylic acid

Product 1

HCID 86730299
5,6-Dihydro-2H-thiopyran-3-carboxamide

Reagents, catalysts & solvents 1

HCID 6228DimethylformamideSolvent

Procedure

To a solution of 5,6-dihydro-2H-thiopyran-3-carboxylic acid (0.84 g, 5.8 mmol) in DMF (29 mL) was added DIPEA (3.4 g, 26 mmol), followed by TBTU (4.1 g, 13 mmol). The resulting mixture was stirred at ambient temperature for 30 minutes, then HMDS (2.1 g, 13 mmol) was added. The mixture was stirred at ambient temperature for 16 hours. The reaction mixture was acidified with 1N aqueous HCl, and extracted with EtOAc (3×). The combined organic extracts were again washed with 1N aqueous HCl, brine, dried over anhydrous Na2SO4, filtered, and concentrated in vacuo. The crude residue was purified by MPLC on silica gel (using a gradient elution of 0-5% MeOH/DCM). Desired fractions were identified, combined and concentrated in vacuo to afford the title compound. 1H NMR (500 MHz, CDCl3): δ 6.68-6.69 (m, 1H); 3.38 (q, J=2.2 Hz, 2H); 2.70 (t, J=5.8 Hz, 2H); 2.50-2.51 (m, 2H).

Workup

  1. stirringThe mixture was stirred at ambient temperature for 16 hours
  2. extractionextracted with EtOAc (3×)
  3. washThe combined organic extracts were again washed with 1N aqueous HCl, brine
  4. dry with materialdried over anhydrous Na2SO4
  5. filtrationfiltered
  6. concentrationconcentrated in vacuo
  7. customThe crude residue was purified by MPLC on silica gel (
  8. washa gradient elution of 0-5% MeOH/DCM)
  9. concentrationconcentrated in vacuo

Sources & evidence

ORD record
ord-feb0ee0103da4daa8a05d94417592741
Source dataset
uspto-grants-2016_07
DOI
10.6084/m9.figshare.5104873.v1
Patent number
US09394282B2

Reaction notes

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On this pageParticipantsProcedureWorkupSources & evidenceReaction notes