Trimethylsulfonium iodide → HCID 86668885, compound

Temperature

-20 °C

To a solution of trimethylsulfonium iodide (110 g) in THF (500 mL) at −30° C. was added lithium hexamethyldisilazide (530 mL, 1N in THF) portionwise over 45 mins. After stirring at −20° C. for 20 mins, (S)-2-trifluoromethyloxirane (37.97 g) was added at the same temperature over 15 mins, and the mixture was allowed to warm to RT and stirred for 3 h. The slurry was then added portionwise to an ice-cold solution of tert-butyl bromoacetate (105.68 g) in NMP (200 mL). The resulting mixture was allowed to warm to RT and stir for 2 days, before dilution with EtOAc (1 L). The organic layer was washed with sodium bicarbonate (sat., aq., 4×400 mL), dried over MgSO4 and evaporated. The residue was purified by silica gel column chromatography (5% EtOAc in hexanes) to obtain the title compound (70.1 g) which was used in the subsequent step without purification. 1H NMR (400 MHz, CDCl3) δ ppm: 1.30 (s, 9H) 3.83-3.96 (m, 2H) 4.14-4.21 (m, 1H) 5.34-5.48 (m, 2H) 5.56-5.71 (m, 1H)

1. temperatureto warm to RT
2. stirringstirred for 3 h
3. temperatureto warm to RT
4. washThe organic layer was washed with sodium bicarbonate (sat., aq., 4×400 mL)
5. dry with materialdried over MgSO4
6. customevaporated
7. customThe residue was purified by silica gel column chromatography (5% EtOAc in hexanes)

ORD record

ord-da59388f1ae84e978f6c947bb5a83bc1

Source dataset

uspto-grants-2015_09

DOI

10.6084/m9.figshare.5104873.v1

Patent number

US09139594B2