Triethylamine → HCID 17821889, compound
Reaction equation
Cl[CH2:2][C:3](=[CH2:6])[C:4]#[N:5].[CH3:7][O:8][P:9]([CH2:13][CH2:14][OH:15])(=[O:12])[O:10][CH3:11].C(N(CC)CC)C>C1COCC1.C1C2NC3C(=CC=CC=3)SC=2C=CC=1>[CH3:7][O:8][P:9]([CH2:13][CH2:14][O:15][CH2:2][C:3](=[CH2:6])[C:4]#[N:5])([O:10][CH3:11])=[O:12]Participants
Conditions
- Temperature
- 65 °C
Procedure
86.3 g (850 mmol) 2-(chloromethyl)-acrylonitrile are added dropwise at room temperature to a solution of 130.9 g (850 mmol) 2-hydroxyethylphosphonic acid dimethylester, 85.9 g (850 mmol) triethylamine (TEA) and 40 mg phenothiazine (stabilizer) in 1 l THF. Subsequently, the mixture is heated for 6 hours at 65° C. under reflux. 9.1 g (90 mmol) TEA and 9.1 g (90 mmol) 2-(chloromethyl)-acrylonitrile are once again added one after the other and the mixture is heated for a further 24 hours under reflux. After the reaction mixture has cooled, the formed deposit of TEA hydrochloride is filtered out and is washed twice with 50 ml THF. After the THF phases have been concentrated on the rotary evaporator, the residual raw product is taken up in 650 ml methylene chloride and washed twice with water. After it has been dried over anhydrous sodium sulphate, the mixture is concentrated and the residual liquid undergoes fractional distillation in the fine vacuum. 101.0 g (54% yield) of a colourless liquid results at b.p. 150° C. (0.05 mbar).
Workup
- temperatureunder reflux
- temperatureis heated for a further 24 hours
- temperatureunder reflux
- temperatureAfter the reaction mixture has cooled
- filtrationthe formed deposit of TEA hydrochloride is filtered out and
- washis washed twice with 50 ml THF
- concentrationAfter the THF phases have been concentrated on the rotary evaporator
- washwashed twice with water
- dry with materialAfter it has been dried over anhydrous sodium sulphate
- concentrationthe mixture is concentrated
- distillationdistillation in the fine vacuum
Sources & evidence
- ORD record
- ord-28fc72b09bfd40d38c95cdc20e1e7b8f
- Source dataset
- uspto-grants-2004_03
- Patent number
- US06710149B2
Reaction notes
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